Surface defect inspection system
Surface defect inspection system (normal type)
It is a system that can inspect the surface condition of specular planar substrate instantaneously with ultra-high sensitivity, applying the principle of a magic mirror transmitted from long ago, and is used by silicon wafer manufacturers all over the world. The inspection can be done non-contact / nondestructively, and the optical system is maintenance free. Optionally, automatic judgment of surface defects It is possible to add functions such as image processing / automatic conveying mechanism / image storage / image printing.
- It instantaneously expresses all the surface condition.
- Optical system corresponds to Class 1.
- The optical system is maintenance free.
- Detection sensitivity change is possible depending on inspection contents.
|Inspection size||φ 100 mm to φ 300 mm from each model|
|Inspection content Flatness,||dimple, mound, saw mark, orange peel etc.|
|Inspection magnification||1-3 times mode switching (Standard feature)|
|Detection sensitivity||Continuous detection sensitivity variable|
|Used light source||550 nm (constant illuminance stabilized light source)|
|Camera||high resolution CCD camera|
|Stage||manual stage (standard specification)|
|Surface inspection of specular wafer|
|Inspection of slip line|
|Inspection of glass substrate|
|Inspection of other specular substrates|
|Motor driven test stage|
|Automatic defect determination image processing device|
- * Demonstration is always available at our company.
- * Sending the sample, it is also possible to return the inspection result by image copy.